| 发明名称 |
Lithographic apparatus having encoder type position sensor system |
| 摘要 |
A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
|
| 申请公布号 |
US2009002653(A1) |
申请公布日期 |
2009.01.01 |
| 申请号 |
US20080153799 |
申请日期 |
2008.05.23 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
STEIJAERT PETER PAUL;BOX WILHELMUS JOSEPHUS;EUSSEN EMIEL JOZEF;LOOPSTRA ERIK ROELOF;VAN DER PASCH ENGELBERTUS ANTONIUS;BEERENS RUUD ANTONIUS;SMITS ALBERTUS ADRIANUS |
| 分类号 |
G03B27/54;G03B27/74 |
主分类号 |
G03B27/54 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
