发明名称 RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTANT POLY(VINYL ACETAL)S
摘要 A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
申请公布号 US2009004599(A1) 申请公布日期 2009.01.01
申请号 US20070769766 申请日期 2007.06.28
申请人 LEVANON MOSHE;LURIE EMMANUEL;KAMPEL VLADIMIR 发明人 LEVANON MOSHE;LURIE EMMANUEL;KAMPEL VLADIMIR
分类号 G03F7/00;G03C1/00 主分类号 G03F7/00
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