发明名称 |
RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTANT POLY(VINYL ACETAL)S |
摘要 |
A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
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申请公布号 |
US2009004599(A1) |
申请公布日期 |
2009.01.01 |
申请号 |
US20070769766 |
申请日期 |
2007.06.28 |
申请人 |
LEVANON MOSHE;LURIE EMMANUEL;KAMPEL VLADIMIR |
发明人 |
LEVANON MOSHE;LURIE EMMANUEL;KAMPEL VLADIMIR |
分类号 |
G03F7/00;G03C1/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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