| 摘要 |
An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, comprises an input device, and a controller configured to periodically change a wavelength of the pulsed light emitted by the light source, wherein the controller is configured to calculate number of pulsed light required to expose one shot region on the substrate based on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated number.
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