发明名称 METHOD FOR PRODUCTION OF CYCLIC COMPOUND HAVING SUBSTITUENT INTRODUCED THEREIN, AND PHOTORESIST SUBSTRATE
摘要 <p>Disclosed is a method for producing an R-group-introduced cyclic compound which has a structure represented by the formula (I) and has at least one substituent (an R group) introduced therein. The method comprises conducting the condensation reaction between a cyclic compound having a structure represented by the formula (I) and a compound represented by the formula (II), wherein an inorganic base containing sodium or cesium is used in the condensation reaction. (I) R-X (II)</p>
申请公布号 WO2009001927(A1) 申请公布日期 2008.12.31
申请号 WO2008JP61731 申请日期 2008.06.27
申请人 IDEMITSU KOSAN CO., LTD.;OWADA, TAKANORI;ISHII, HIROTOSHI;YOMOGITA, AKINORI;SHIBATA, MITSURU;TOMOTSU, NORIO 发明人 OWADA, TAKANORI;ISHII, HIROTOSHI;YOMOGITA, AKINORI;SHIBATA, MITSURU;TOMOTSU, NORIO
分类号 C07C67/31;C07C69/712;G03F7/039;H01L21/027 主分类号 C07C67/31
代理机构 代理人
主权项
地址