| 摘要 |
A substrate mounting table preventing generation of etching residue and plasma processing apparatus are provided to perform uniform plasma processing by removing a dispersion of a electromagnetic field in a sheath area corresponding to a hole of a lift pin. A substrate mounting table(4) mounts a substrate inside a container of a plasma processing apparatus performing a plasma process about the substrate(G), and is arranged in between spacers consisting of an insulating member inside the container in order to form a space. The space consists of an atmosphere environment.
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