| 摘要 |
<p>A radiation detector having radiation sensing surface, manufacturing method thereof, and lithography apparatus including the same are provided to maintain or reduce overlay errors by using a strong TIS(Transmission Image Sensor). A radiation detector having a radiation sensing surface includes a silicon substrate(W), a dopant layer, a first electrode, and a second electrode. The silicone substrate has a surface region of a first face having a doping profile. The dopant layer is provided on the first face of the silicon substrate, and includes a first layer and a second layer of a dopant material. The second layer is diffusion layer contacting with the surface region of the first face of the silicon substrate. The first electrode is connected to the dopant layer. The second electrode is connected to the silicon substrate. The surface region of the first face of the silicon substrate and the second layer are arranged in order to form the radiation sensing surface.</p> |
