发明名称 METHOD FOR MANUFACTURING CAPACITOR OF SEMICONDUCTOR
摘要 <p>The present invention relates to a method of producing a semiconductor capacitor, and more particularly, to a method of producing a semiconductor capacitor, in which an electroless plating is performed during the production of a lower electrode to form a lower electrode.</p>
申请公布号 WO2009002058(A2) 申请公布日期 2008.12.31
申请号 WO2008KR03553 申请日期 2008.06.23
申请人 HAN, HEE;LG CHEM, LTD.;KIM, KYUNG-JUN;CHOI, BYUNG-KYU 发明人 HAN, HEE;KIM, KYUNG-JUN;CHOI, BYUNG-KYU
分类号 H01L27/108 主分类号 H01L27/108
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