| 摘要 |
<p>A multilayer hard thin film for the exfoliation which can be generated in the high speed cutting process and the cutting tool minimizing the tool abrasive phenomenon is provided. As to the multilayer hard thin film for the cutting tool, using the physical vapor deposition, and the underlying layer is evaporated in the insert, which is the cemented carbide tool the end mill, and the drill or the cermet over the tool for the crystal orientation of(200) side and adhesion force improvement. Consecutively, N multi-layered thin film which is the intermediate layer(Ti,Al) is evaporated in order to improve the shock resistance and chipping resistance. Consecutively, as to A-horizon and B-horizon and layer and the hard thin film by turns laminated by plural number to D layer the top layer. [Composition expression 1]: the thin film composition ratio of the A,C layer = [Ti(1-x)Alx][C(1-y)Ny], 0.3<=x<=0.5, 0.5<=y<=1, [Composition expression 2]: the thin film composition ratio of B-horizon = [Ti(1-q)Alq][C(1-r)Nr], 0.6<=q<=0.8, 0.5<=r<=1, [Composition expression 3]: the thin film composition ratio of D layer = [Al(1-(a+b))TiaMb]N. M[Si,Cr] = 0.3<=a<=0.5, 0.02<=b<=0.08. The thin film composition of the underlying layer has the composition consisting of the composition expression 1, the thin film structure of the intermediate layer shows the multi-layered thin film which it by turns deposits each other to the A-horizon / B-horizon / layer consisting of the composition expression 1,2. The thin film structure characterizes A/B/C/D layer or the to deposit on by turns by A/D/C/B-horizon net thing having the different composition ratio consisting of the composition expression 1,2,3.</p> |
