发明名称 IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME
摘要 An image sensor and a manufacturing method thereof are provided to reduce gap between micro lenses with a dual method of forming a micro lens in order to improve sensitivity. An image sensor comprises an interlayer dielectric layer(130), a plurality of first micro lenses(181), and a plurality of second micro lenses. The interlayer dielectric layer is formed on a substrate(110) of a pixel region. The first micro lens is formed on the interlayer dielectric layer in order to be separated each other. The second micro lens is formed between the first micro lenses. The diameter of the second micro lens is bigger than the diameter of the first micro lens.
申请公布号 KR20080113489(A) 申请公布日期 2008.12.31
申请号 KR20070062023 申请日期 2007.06.25
申请人 DONGBU HITEK CO., LTD. 发明人 PARK, JIN HO
分类号 H01L27/146 主分类号 H01L27/146
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