发明名称 SENSOR APPARATUS OF EVAPORATION EQUIPMENT
摘要 A sensor apparatus is provided to extend the management period by supplying a sensor to a rotation plate by a sensor feeding unit. A sensor apparatus measures the deposition amount or the deposition speed of the deposition apparatus. The sensor apparatus includes a housing(10), a rotation plate(50), a sensor feeding unit(70), and a rotation driving source. The sensor passing hole(14) and a sensing part(15) are formed in the housing to be separated to a circumference direction. The sensing part is formed to be penetrated so that the sensor unit senses the deposition amount supplied through the sensor passing hole. The rotation plate is rotatably installed in the housing. The plurality of sensor receiving groove(71) corresponding to the sensor passing hole and the sensor unit are formed in the rotation plate. A sensor supply unit loads the plurality of sensor units. A sensor supply unit moves and mounts one sensor unit of the plurality of sensor units to a sensor receiving groove positioned to correspond to the sensor passing hole among a plurality of the sensor receiving grooves through sensor passing holes. A rotation driving source rotates the rotation plate to selectively move the sensor receiving groove to positions corresponding to the sensor passing hole and the sensor unit.
申请公布号 KR20080114306(A) 申请公布日期 2008.12.31
申请号 KR20070063725 申请日期 2007.06.27
申请人 DOOSAN MECATEC CO., LTD. 发明人 PARK, KI JU;KWON, JIN HAON;SONG, KYO JUN;CHO, SUNG JAE;LEE, HYUN KI;MOK, JIN IL
分类号 H01L21/02;H01L21/20 主分类号 H01L21/02
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