发明名称 SURFACE ACOUSTIC WAVE DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 A method for fabricating a small and low-profile surface acoustic wave device which can be formed collectively by a wafer process without causing deterioration in characteristics. The surface acoustic wave device comprises a piezoelectric substrate (1), an IDT (2) formed on one major surface of the piezoelectric substrate (1) and having at least one interdigital electrode, and a protective cover (6) forming a hollow containing space (7) together with the one major surface by covering the IDT (2) above the one major surface. In this surface acoustic wave device, the protective cover (6) is provide with a through hole (15) and composed, at least partially, of a photocurable material containing an acid generation material which contains fluorine.
申请公布号 WO2009001650(A1) 申请公布日期 2008.12.31
申请号 WO2008JP60081 申请日期 2008.05.30
申请人 KYOCERA CORPORATION;FUKANO, TORU;NISHII, JUNYA 发明人 FUKANO, TORU;NISHII, JUNYA
分类号 H03H9/25;H03H3/08;H03H9/145 主分类号 H03H9/25
代理机构 代理人
主权项
地址