发明名称 SELECTABLE DEVICE OPTIONS FOR CHARACTERIZING SEMICONDUCTOR DEVICES
摘要 <p>A system, method and program product that allows multiple devices (18) to be placed between pads (12, 14, 16) such that a Back End Of Line (BEOL) mask change can be used to select different device options. A system (58) is disclosed for implementing a testsite for characterizing devices in an integrated circuit technology, and includes: a system (60) for designing a plurality of device options (dl, d2, d3, d4) for a set of chip pads (12, 14, 16); a system (62) for designing a pseudo wiring layout for each of the plurality of device options; a system (64) for selecting one of the device options; a system (66) for mapping the pseudo wiring layout for a selected device option to a predetermined design level; and a system (50) for outputting a configured mask design at the predetermined design level having a wiring layout mapped for the selected device option.</p>
申请公布号 WO2009003151(A1) 申请公布日期 2008.12.31
申请号 WO2008US68452 申请日期 2008.06.27
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;CHOU, ANTHONY, I-CHIH;DUNN, JAMES, S.;DUFRENE, BRIAN, M.;LUMBRA, CHRISTOPHER, H.;NARASIMHA, SHREESH;PUTNAM, CHRISTOPHER, S.;RAINEY, BETHANN;SCHNABEL, CHRISTOPHER, M. 发明人 CHOU, ANTHONY, I-CHIH;DUNN, JAMES, S.;DUFRENE, BRIAN, M.;LUMBRA, CHRISTOPHER, H.;NARASIMHA, SHREESH;PUTNAM, CHRISTOPHER, S.;RAINEY, BETHANN;SCHNABEL, CHRISTOPHER, M.
分类号 G01R31/26;H01L21/00 主分类号 G01R31/26
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