A deposition apparatus is provided to deposit material with a uniform thickness and reduce a deposition time by supporting a plurality of an evaporation source in one movable plate and depositing the deposition material in a fixed substrate. A deposition apparatus includes a movable plate(110), a plurality of evaporation sources(120), and a drive unit(140). The movable plate is installed in a frame(100) to reciprocate. An evaporation source evaporates the deposition material to be deposited on the substrate. The evaporation source is installed in the movable plate in a direction crossing the moving direction of the movable plate. The drive unit reciprocates the moving plate.
申请公布号
KR20080114299(A)
申请公布日期
2008.12.31
申请号
KR20070063711
申请日期
2007.06.27
申请人
DOOSAN MECATEC CO., LTD.
发明人
KWON, JIN HAON;SONG, KYO JUN;CHO, SUNG JAE;PARK, KI JU;LEE, HYUN KI;MOK, JIN IL