| 摘要 |
<p>A charged particle beam writing method is provided to perform pattern of a high accuracy by preventing a thermal deterioration of writing accuracy. A charged particle beam writing method writes a first sample using a charged particle beam within a writing device(100), and not performs a return action of a second sample during the first sample writing although the second sample is arranged in one side among a carrier path including an entrance(120) and an exit of the writing device. The return of the second sample is performed after completing the writing of the first sample.</p> |
