COPOLYMER AND COMPOSITION FOR ORGANIC ANTIREFLECTIVE LAYER

摘要

A copolymer for an organic antireflective layer is provided to ensure fast etching rate of an organic antireflective layer and to manufacture an organic antireflective layer useful for the ultra-fine patterning of a semiconductor. A copolymer for an organic antireflective layer is indicated as the chemical formula 1. In the formula 1, R1 is hydrogen or C1-10 alkyl group; R2 is hydrogen, C1-10 alkyl group, and C1-20 arylalkyl group; R3 is hydrogen or methyl group; m and n are a number showing a repeating unit within the respective main chain, wherein m+n=1, 0.05