| 摘要 |
An emission unit and a substrate cleaning apparatus having the same are provided to control the height and injecting angle of a chemical injector and a drying gas injector fixed in the inside of a fixing unit according to the size and chemical injection rate of a substrate. An emission unit comprises a chemical injector(410), a drying gas injector(420), a fixing unit(430), a supporting part(440) and a controlling element(450). The chemical injector sprays chemical on a substrate. The drying gas injector is arranged to be adjacent to the chemical injector. The drying gas injector sprays the dry gas on the substrate. The fixing unit fixes the chemical injector and drying gas injector so that the chemical injector and drying gas injector is integrally formed. The supporting part is arranged to be adjacent to the fixing unit. The supporting part supports the outer side of the fixing unit. The height between the fixing unit and the supporting part is controlled in the controlling element. The angle adjusting of the fixing unit based on the substrate surface is possible in the controlling element. The controlling element connects the supporting part to the fixing unit.
|
