| 摘要 |
<p>Device for the UV treatment of a wafer or substrate A device for UV treatment of an object, especially a wafer or substrate, with UV light contains a UV light source (3) comprising a plurality of LEDs (11) and a heat sink (12). The LEDs emit UV light or light containing UV light. The heat sink serves to emit the lost heat generated by the LEDs to the ambient environment.</p> |
