发明名称 Semiconductor device and method of manufacturing the same
摘要 The present invention relates to a semiconductor device in which an electrode of a device formed on a substrate such as a semiconductor wafer and an electrode of a wiring structure such as an interposer are connected to each other through a connecting electrode extending through the substrate, and a method of manufacturing the same. A semiconductor device according to the present invention comprises a first substrate including a front surface and a back surface, a first device having a first electrode being formed on the front surface; and a wiring structure formed with a second electrode, the wiring structure having a principal surface. The first electrode of the first device and the second electrode of the wiring structure are connected to each other by a connecting electrode extending through the first substrate from the front surface to the back surface thereof. Substantially all the back surface of the first substrate is bonded to the principal surface of the wiring structure. A dielectric film formed between the first substrate and the wiring structure may be an adhesive layer.
申请公布号 US7470998(B2) 申请公布日期 2008.12.30
申请号 US20060373154 申请日期 2006.03.13
申请人 OCTEC INC.;TOKYO ELECTRON LIMITED;SHARP KABUSHIKI KAISHA;IBIDEN CO., LTD. 发明人 OKUMURA KATSUYA;MARUYAMA KOJI;NAGASEKI KAZUYA;RAI AKITERU
分类号 H01L23/52;H01L21/3205;H01L21/768;H01L23/12;H01L23/48;H01L25/065;H01L25/07;H01L25/18;H01L29/40 主分类号 H01L23/52
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