发明名称 Correction of optical proximity effects by intensity modulation of an illumination arrangement
摘要 A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.
申请公布号 US7471375(B2) 申请公布日期 2008.12.30
申请号 US20060353234 申请日期 2006.02.14
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分类号 G03B27/54;G03B27/42;G03B27/72;G03C5/00 主分类号 G03B27/54
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