发明名称 |
Lithographic apparatus with patterning device position determination |
摘要 |
A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.
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申请公布号 |
US7471373(B2) |
申请公布日期 |
2008.12.30 |
申请号 |
US20040876786 |
申请日期 |
2004.06.25 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BARTRAY PETRUS RUTGERUS;BOX WILHELMUS JOSEPHUS;FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS;LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES;VAN DER PASCH ENGELBERTUS ANTONIUS FRANCISCUS;VAN DER WIJST MARC WILHELMUS MARIA;ENGELS MARC JOHANNES MARTINUS |
分类号 |
G01B11/00;G03B27/42;G03B27/32;G03B27/58;G03F7/20;H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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