发明名称 Active biasing in metal oxide semiconductor (MOS) differential pairs
摘要 Apparatus and methods advantageously maintain transistors of open-drain differential pairs biased in the saturation region when "active," rather in than the triode or linear region. The biasing techniques are effective over a broad range of process, voltage, and temperature (PVT) variations. By controlling a high voltage level used to drive the gate of a transistor of the differential pair, the biasing of the transistor in the saturation region is maintained. In one embodiment, the low voltage level used to cut off the transistor of the differential pair is also controlled. These techniques advantageously permit differential drivers to exhibit relatively large output swings, relatively high edge rates, relatively high return loss, and relatively good efficiency.
申请公布号 US7471107(B1) 申请公布日期 2008.12.30
申请号 US20050128953 申请日期 2005.05.12
申请人 PMC-SIERRA, INC. 发明人 FORTIN GUILLAUME;ROY CHARLES;GAGNON MATHIEU
分类号 H03K19/0175 主分类号 H03K19/0175
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