| 摘要 |
<p>Disclosed is a photocurable/thermosetting resin composition developable with a diluted alkali solution, which resin composition is characterized by containing (A) an ethylenically unsaturated group-containing carboxylic acid-containing resin, (B) a sensitizer containing a coumarin backbone represented by the formula (I) below and having a maximum absorption wavelength at 360-410 nm, (C) a photopolymerization initiator, (D) a compound having two or more ethylenically unsaturated groups in a molecule, (E) a filler and (F) a thermosetting component. ® KIPO & WIPO 2009</p> |
