GENERATION OF PATTERNS USING ATOMIC FORCE MICROSCOPE NANOLITHOGRAPHY

摘要

The method manufacturing the pattern using the atomic force microscope nanolithography is provided to improve the height of the nano oxidation structure over 100 nm in the lithography using the atomic force microscope. The method for manufacturing the pattern using the atomic force microscope comprises as follows. A step is for irradiating the ion beam of proton or the argon on the substrate. A step is for performing the atomic force microscope lithography on the substrate at which the ion beam is irradiated and for forming the oxidation structure(d) by applying the positive voltage in the atomic force microscope tip(e). .