| 摘要 |
The invention comprises dipropylboric acid (p-cyclohexyl-phenylamide), dipropylboric acid (p-chlorophenyl amide), dicyclohexylboric acid anilide, dipropylboric acid (N-methyl-N-phenyl amide). Diorganoboric acid amides of the general formula <FORM:0975859/C1/1> in which R1 represents a substituted or unsubstituted alkyl, cycloalkyl or aryl radical, R1 and R11 are the same or different and represents substituted or unsubstituted alkyl, cycloalkyl or aryl radicals or R11 can also represent a hydrogen atom, are made by reacting a triorganoborane BR3 with a boron trisamide B(NR1R11)3 at a temperature above 40 DEG C. Preferably the reaction is effected in an inert gas atmosphere at temperatures above 80 DEG C. Inert solvents or suspending agents such as hydrocarbons may be used. Examples disclose the preparation of (1) dipropylboric acid anilide from boron trisanilide and boron tripropyl; (3) diethylboric acid N-diethylamide from boron tris (diethylamide) and boron triethyl; (4) dipropyl boric acid-(N-methyl-N-phenylamide) from boron tripropyl and boron tris-(N-methyl-N-phenyl-amide); (5) dicyclohexylboric acid anilide from boron tris-anilide and boron tricyclohexyl; (6) dipropylboric acid (p-chlorophenylamide) from boron tris (p-chlorophenylanilide) and boron tripropyl; (7) dipropylboric acid (p-cyclohexyl-phenylamide) from boron tris (p-cyclohexyl-phenylamide) and boron tripropyl. Lists giving many suitable triorganoboranes and boron tris-amides are included. |
