发明名称 |
HEAT SHIELD PLATE FOR SUBSTRATE ANNEALING APPARATUS |
摘要 |
A heat shield plate for a substrate annealing apparatus is provided with a flat-plate-like substrate (1) horizontally supported; a heater (5) positioned above the substrate for heating the upper surface of the substrate with radiation heat; and a heat shield plate (10) which can horizontally move between a shielding position for shielding the substrate from the heater and an open position out of the shielding position. The heat shield plate (10) is composed of a structure member (12) composed of a low thermal expansion material (carbon composite material) which is deformed little due to temperature difference at the shielding position, and a heat insulating member (14) which covers the upper surface of the structure member and keeps the surface at an allowable temperature or below. ® KIPO & WIPO 2009
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申请公布号 |
KR20080113025(A) |
申请公布日期 |
2008.12.26 |
申请号 |
KR20087021400 |
申请日期 |
2007.03.15 |
申请人 |
IHI CORPORATION |
发明人 |
ISHIHARA TERUMASA;HASHIMOTO TAKAHARU;MIZUNO MASAYUKI;MORITA MASARU |
分类号 |
F27D99/00;H01L21/324;H01L21/205;H01L21/26;H01L21/31 |
主分类号 |
F27D99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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