发明名称 Application of impressed-current cathodic protection to prevent metal corrosion and oxidation
摘要 A new method is provided for the processing of metals, most notably copper, such that damage to exposed surfaces of these metals is prevented. During a step of semiconductor processing, which results in exposing a metal surface to a wet substance having a pH value, a voltage is applied to the metal that is exposed. The value of the applied voltage can, dependent on the value of the pH constant of the wet substance, be selected such that the exposed metal surface is protected against alkaline effects of the wet substance.
申请公布号 US7468321(B2) 申请公布日期 2008.12.23
申请号 US20060382500 申请日期 2006.05.10
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHING KAI-MING;LIN CHIA-FU;TSENG WEN-HSIANG;LIN TA-MIN;CHEN YEN-MING;LEE HSIN-HUI;SU CHAO-YUAN;TSENG WEN-HSIANG
分类号 H01L21/44;H01L21/302;H01L21/461;H01L21/60;H01L21/768;H01L23/544 主分类号 H01L21/44
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