发明名称 |
PHASE-CHANGE MEMORY UNIT, METHOD OF FORMING THE PHASE-CHANGE MEMORY UNIT, PHASE-CHANGE MEMORY DEVICE HAVING THE PHASE-CHANGE MEMORY UNIT AND METHOD OF MANUFACTURING THE PHASE-CHANGE MEMORY DEVICE |
摘要 |
<p>A phase-change memory unit and a manufacturing method thereof and a phase change memory device including this and a manufacturing method thereof are provide to authorize current from a conductive construct to a first electrode or a bottom electrode and as a conductive construct and/or an ohmic layer pattern are contacted with the side or bottom surface of the first electrode or the bottom electrode. A phase-change memory unit comprises an isolation structure(210), a conductive construct(225), a first electrode(250), a phase change material layer pattern(275), a second electrode(280). The isolation structure is formed on a substrate(200). The isolation structure has an opening(215) exposing substrate. The conductive construct is formed within the opening. The first electrode has a side wall and a bottom surface contacted with the conductive construct. The phase change material layer pattern is formed on the first electrode and isolation structure. The second electrode is formed on the phase change material layer pattern.</p> |
申请公布号 |
KR20080111206(A) |
申请公布日期 |
2008.12.23 |
申请号 |
KR20070059273 |
申请日期 |
2007.06.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
OH, GYU HWAN;KANG, SHIN JAE;PARK, IN SUN;LIM, HYUN SEOK;LEE, HYUN SUK;LIM, NAK HYUN |
分类号 |
H01L27/115 |
主分类号 |
H01L27/115 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|