发明名称 Method of forming a sputtering target assembly and assembly made therefrom
摘要 A method of forming a sputtering target assembly and the sputtering target assembly made therefrom are described. The method includes bonding a sputtering target to a backing plate at a low temperature. Also described is a method of forming a sputtering target assembly such that a gap is formed between the sputtering target and the backing plate. Also described is a method of forming a sputtering target assembly providing a mechanism to prevent unintended sputtering into the backing plate.
申请公布号 US7467741(B2) 申请公布日期 2008.12.23
申请号 US20030689771 申请日期 2003.10.21
申请人 CABOT CORPORATION 发明人 WICKERSHAM, JR. CHARLES E.;WORKMAN DAVID P.
分类号 C23C14/34;B21K25/00;B23K1/00;B23K20/12 主分类号 C23C14/34
代理机构 代理人
主权项
地址