发明名称 |
Amine compound, chemically amplified resist composition and patterning process |
摘要 |
Chemically amplified resist compositions comprising amine compounds having a fluorinated alkyl group offer an excellent resolution and a precise pattern profile and are useful in microfabrication by KrF, ArF, F2, EUV, EB or X-ray lithography. They are also effective in the immersion lithography.
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申请公布号 |
US7468236(B2) |
申请公布日期 |
2008.12.23 |
申请号 |
US20060543833 |
申请日期 |
2006.10.06 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE TAKERU;HATAKEYAMA JUN |
分类号 |
G03C1/73;G03C1/00 |
主分类号 |
G03C1/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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