Mask for photolithography, method of forming thin film, liquid crystal display device, and method of producing the liquid crystal display device

摘要

A mask for photolithography in which a semi-transmission film is formed so that the phase difference of lights passing through a semi-transmission portion and a transmission portion of the mask for photolithography is between (-�+2 m) pi and (�+2 m) pi inclusive, where m is an integer. The invention makes it possible to efficiently and properly form a thin film having a multi-step structure by a single process.