| 摘要 |
Disclosed is a structural member for a plasma treatment system, which is excellent in film-forming properties, durability and reliability. The structural member comprises a substrate and a ceramic film provided on the substrate, wherein the ceramic film has a purity of 98% or higher. In the ceramic film, a particle constituting the film has a particle diameter of 50 nm or smaller, and the amount of moisture released from the film is 1019 molecules/cm2 or less. ® KIPO & WIPO 2009
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