| 摘要 |
The method for forming microlens of the image sensor is provided to enhance the reflow margin by using the reflow rate difference of the hydrophobic film and hydrophile layer and suppress the bridge between the micro lens. The method for forming microlens of the image sensor comprises as follows. A step is for forming the hydrophile layer(304) on the predetermined sub-layer formed on the semiconductor substrate. A step is for forming the hydrophobic film(306) on the hydrophile layer. A step is for forming the trench of the predetermined depth by etching selectively so that the hydrophile layer is exposed to the hydrophobic film. A step is for forming the photoresist for the micro lens on the hydrophobic film. A step is for completing the micro lens(310a) from the photoresist for the micro lens by using the thermal re-flow(reflow) process.
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