METHODS FOR CLEANING A FURNACE

摘要

A method for washing a diffusion furnace is provided to shorten cleaning time and improve the productivity of a semiconductor product by removing the residue of deposition materials formed within a tube of a diffusion furnace within fast time. A method for washing a diffusion furnace having a tube in which a deposition producing is performed comprises: a step for setting temperature within a tube into cleaning temperature(S200); a step for flowing cleaning gas including nitrogen(N2) gas and chlorine trifluoride(ClF3) gas to the tube(S210); and a step for washing the tube(S220). The inflow rate of nitrogen gas versus the inflow of chlorine trifluoride gas is 1.4 :1 to 1 : 1.