FILM FORMING METHOD AND FILM FORMING APPARATUS

摘要

A film forming method is provided with a step of placing a subject to be processed in a processing container which can be vacuumized by exhaustion, and a film forming step wherein a tungsten film is formed on the surface of the subject by supplying a tungsten containing gas and a reducing gas into the processing container and activating the reducing gas by a heated catalytic body. ® KIPO & WIPO 2009