发明名称 |
METHOD FOR PRODUCING SILICON THIN FILM OR ISOTOPICALLY ENRICHED SILICON THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a smooth silicon and isotopically enriched silicon thin film each having an isotopic composition equivalent to a raw material without using an electromagnetic separation process and a silane gas as a raw material which are used in the prior art. SOLUTION: A silicon thin film or an isotopically enriched silicon thin film is formed on a substrate by using a halogenated silicon or a halogenated silicon in which silicone isotope is enriched as a raw material and allowing the raw material to react with hydrogen. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008303078(A) |
申请公布日期 |
2008.12.18 |
申请号 |
JP20070149102 |
申请日期 |
2007.06.05 |
申请人 |
JAPAN ATOMIC ENERGY AGENCY;WAKASAWAN ENERG KENKYU CENTER;IBARAKI UNIV |
发明人 |
YAMADA YOICHI;YAMAMOTO HIROYUKI;OBA HIRONORI;EZAKA FUMITAKA;YAMAGUCHI KENJI;SHAMOTO SHINICHI;YOKOYAMA ATSUSHI;HOJO KIICHI;SASASE MASAHITO;UDONO HARUHIKO |
分类号 |
C01B33/02;C01B33/03 |
主分类号 |
C01B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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