发明名称 METHOD FOR PRODUCING SILICON THIN FILM OR ISOTOPICALLY ENRICHED SILICON THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a smooth silicon and isotopically enriched silicon thin film each having an isotopic composition equivalent to a raw material without using an electromagnetic separation process and a silane gas as a raw material which are used in the prior art. SOLUTION: A silicon thin film or an isotopically enriched silicon thin film is formed on a substrate by using a halogenated silicon or a halogenated silicon in which silicone isotope is enriched as a raw material and allowing the raw material to react with hydrogen. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008303078(A) 申请公布日期 2008.12.18
申请号 JP20070149102 申请日期 2007.06.05
申请人 JAPAN ATOMIC ENERGY AGENCY;WAKASAWAN ENERG KENKYU CENTER;IBARAKI UNIV 发明人 YAMADA YOICHI;YAMAMOTO HIROYUKI;OBA HIRONORI;EZAKA FUMITAKA;YAMAGUCHI KENJI;SHAMOTO SHINICHI;YOKOYAMA ATSUSHI;HOJO KIICHI;SASASE MASAHITO;UDONO HARUHIKO
分类号 C01B33/02;C01B33/03 主分类号 C01B33/02
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