| 摘要 |
An apparatus for cleaning a sawn wafer block includes a cleaning basin, a fixture for holding a sawn wafer block in the cleaning basin such that, when cleaning liquid is present in the cleaning basin, at least a portion of the wafer block having sawn gaps is disposed in the cleaning liquid, at least one outlet port in a bottom region of the cleaning basin, and a closer for the outlet port, by means of which the outlet port may be opened and closed. The closer, the outlet port and the bottom region of the cleaning basin are configured such that, by opening the closer the cleaning liquid is drainable so fast from at least the area of the cleaning basin having the wafer block disposed therein that contaminants are removable from the sawn gaps due to a suction effect of the cleaning liquid.
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