METHOD OF FORMING OPTICAL THIN FILM, OPTICAL SUBSTRATE AND DEVICE FOR FORMING THE OPTICAL THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of forming optical thin film which uniformizes the optical film thickness (nd) as a whole, by uniformizing not only the physical film thickness (d) but also the refractive index (n) on optical substrates (OE).

SOLUTION: The method of forming optical thin film according to the first point of view is a method of forming an optical thin film on the substrates (OE) arranged in a vacuum chamber 12. The method of forming optical thin film comprises a retention process S11 of retaining the substrates onto a plurality of retention frames 33 disposed on a substrate retaining part 19; a heating process S12 of heating the substrates; and an ejection process S15 of ejecting vapor deposition material from a vapor deposition source, and the retention frames 33 makes the substrates (OE) as a whole to be in a state of being uniformly heated.

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