Electrodeposition baths containing a mixture of boron-containing compounds and chlorhexidine

摘要

Disclosed is an electrodeposition bath comprising a mixture of (i) at least one boron-containing compounds and (ii) chlorhexidine for controlling the growth of microorganisms in the electrodeposition bath. The combination of (i) and (ii) at a low concentration provides better control of microbes than does either (i) or (ii) at higher concentrations.