MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION

摘要

A multivariate solver for optical proximity correction is provided to facilitate mass production. A multivariate solver manufacturing method for optical proximity correction comprises: a step for simulating the photo lithography process by using a mask(18) layout; a step for preturbing each edge segment within the mask layout by fixed amount; a step for simulating a photo lithography process by using the layout initially perturbed; a step for determining a resist image difference between a resist image which is firstly simulated and a resist image which is secondly simulated about each edge segment; a step producing a multi solver matrix including resist image differences about all edge segments; a step for determining a correction delta vector by using pseudo inversion of the multi solver matrix; a step for preturbing each edge segment within the layout perturbed with the correction delta value corresponding to the correction delta vector; a step for simulating the photo lithography process by using the other perturbed layout; a step for updating a multi solver matrix based on resist image values which are thirdly simulated about each edge segment; and a step for updating the correction delta vector by using pseudo inversion of the updated multi solver matrix.