PHOTOMASKS USED TO FABRICATE INTEGRATED CIRCUITRY, FINISHED-CONSTRUCTION BINARY PHOTOMASKS USED TO FABRICATE INTEGRATED CIRCUITRY, METHODS OF FORMING PHOTOMASKS, AND METHODS OF PHOTOLITHOGRAPHICALLY PATTERNING SUBSTRATES

摘要

A finished-construction binary photomask used to fabricated integrated circuitry includes a substrate having a device region and a non-device region. The device region has a transparent substrate having a pair of spaced adjacent binary features formed thereover. The spaced adjacent binary features have an opaque material and a phase-shifting material. The phase-shifting material is received between the transparent substrate and the opaque material. Sidewalls of the spaced adjacent binary features may include a coating layer. Other embodiments, including methods, are contemplated.