发明名称 METHOD OF FABRICATION MEMS INTEGRATED CIRCUITS
摘要 <p>A method of fabricating a plurality of MEMS integrated circuits from a wafer having a MEMS layer formed on a frontside thereof and a polymer coating over said MEMS layer, said polymer coating having a plurality of frontside dicing streets defined therethrough, said method comprising the steps of: (a) releasably attaching a first holding means to said polymer coating; and (b) performing at least one operation on a backside of the wafer, said at least one operation including etching a plurality of backside dicing streets through the wafer, each backside dicing street meeting with a respective frontside dicing street, thereby providing the plurality of MEMS integrated circuits releasably attached to said first holding means, wherein each MEMS integrated circuit comprises a respective polymer coating.</p>
申请公布号 WO2008151354(A1) 申请公布日期 2008.12.18
申请号 WO2008AU00553 申请日期 2008.04.22
申请人 SILVERBROOK RESEARCH PTY LTD;MCAVOY, GREGORY JOHN;SILVERBROOK, KIA;KERR, EMMA ROSE;BAGNAT, MISTY;LAWLOR, VINCENT PATRICK 发明人 MCAVOY, GREGORY JOHN;SILVERBROOK, KIA;KERR, EMMA ROSE;BAGNAT, MISTY;LAWLOR, VINCENT PATRICK
分类号 H01L21/78 主分类号 H01L21/78
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