发明名称 SUPPORT ASSEMBLY
摘要 A support assembly is provided to perform a single dry etch process in a single chamber as remote plasma generation, heating and cooling are made. A support assembly(300) comprises a body(380), a vacuum pipe(313), a heat transfer fluid conduit(361), a gas pipe(335). The body is materially disc-shaped. The vacuum pipe, heat transfer fluid conduit and gas pipe are combined in the body. The body of disc-shaped comprises a top surface(382), a bottom surface(384), a cylindrical outside surface(388), a thermocouple, a flange(390), a fluidic channel(360), a groove(316), a hole and a body gas pipe. The thermocouple is built in the body of disc-shaped. The flange is radially extended from the cylindrical outside surface to outside. The fluidic channel is formed at the flange and bottom surface vicinity in the body of disc-shaped. The groove is formed within the top surface of the body of disc-shaped. The hole unites one or more grooves with the vacuum pipe of shaft. The body gas pipe is formed through the body of disc-shaped. The body gas pipe unites the gas pipe of shaft with the cylindrical outside surface.
申请公布号 KR20080110566(A) 申请公布日期 2008.12.18
申请号 KR20080113993 申请日期 2008.11.17
申请人 APPLIED MATERIALS INC. 发明人 CHIEN TEH KAO;CHIUKIN (STEVE) LAI;JOEL M. HUSTON;MEI CHANG;YU CHANG;WIE W. WANG;JING PEI (CONNIE) CHOU;SAL UMOTOY;SON TRINH;XIAOXIONG (JOHN) YUAN;XINLIANG LU;SEE ENG PHAN
分类号 H01L21/205;H01L21/28;C23C16/455;C23F1/00;H01J37/32;H01L21/00;H01L21/302;H01L21/3065;H01L21/3205;H01L21/8238;H01L23/12;H01L23/52 主分类号 H01L21/205
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