发明名称 METHOD FOR TREATING SOLUTION AFTER FERRITE MEMBRANE FORMATION
摘要 PROBLEM TO BE SOLVED: To shorten the processing time required for disposal of solution having been used for forming a ferrite film. SOLUTION: A film forming device is connected to a pipe system for film formation. Chemistry decontamination of the pipe inner surface of the pipe system is carried out. After the completion of the decontamination, film forming aqueous solution to be used for ferrite film formation (containing organic acid solution containing iron (II) ion, oxidizer, and pH adjustor) is adjusted in temperature, and the ferrite film is formed on the pipe inner surface. The method for treating the used film forming aqueous solution (waste liquid) after the ferrite film formation is as follows. Solid particles contained in the waste liquid is removed by a filter. A pH adjustor (hydrazine) is injected into the waste liquid so that the pH of the waste liquid circulating in a place for film formation (for example, recirculating system pipe). Iron (II) ions contained in the waste liquid are removed by cation-exchange resin while the pH is maintained and organic acid (formic acid) contained in the waste liquid is decomposed using the oxidizer and catalyst. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008304388(A) 申请公布日期 2008.12.18
申请号 JP20070153022 申请日期 2007.06.08
申请人 HITACHI-GE NUCLEAR ENERGY LTD 发明人 NAGASE MAKOTO;HOSOKAWA HIDEYUKI;MORISAWA SATOSHI
分类号 G21D3/08;G21D1/00 主分类号 G21D3/08
代理机构 代理人
主权项
地址