发明名称 |
METHOD OF FORMING THIN METAL FILM AND THIN METAL FILM MANUFACTURED BY THE FORMING METHOD |
摘要 |
An under-layer 2 comprising a coupling agent having a metal element to be transformed to an oxide is disposed on the surface of an inorganic oxide substrate 1, and a liquid containing micro-fine metal particles dispersed therein is coated on the under-layer 2 to form a micro-fine metal particle layer 3. Then, temperature is elevated to a metallizing temperature of the micro-fine metal particles, to form a thin metal film layer 5.
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申请公布号 |
US2008311414(A1) |
申请公布日期 |
2008.12.18 |
申请号 |
US20080138561 |
申请日期 |
2008.06.13 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
TANAKA HISAHIRO;NOTOHARA YASUHIRO;YATSUNAMI RYUICHI;MIYANISHI SATORU |
分类号 |
B32B15/00;B05D3/02 |
主分类号 |
B32B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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