发明名称 METHOD OF FORMING THIN METAL FILM AND THIN METAL FILM MANUFACTURED BY THE FORMING METHOD
摘要 An under-layer 2 comprising a coupling agent having a metal element to be transformed to an oxide is disposed on the surface of an inorganic oxide substrate 1, and a liquid containing micro-fine metal particles dispersed therein is coated on the under-layer 2 to form a micro-fine metal particle layer 3. Then, temperature is elevated to a metallizing temperature of the micro-fine metal particles, to form a thin metal film layer 5.
申请公布号 US2008311414(A1) 申请公布日期 2008.12.18
申请号 US20080138561 申请日期 2008.06.13
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 TANAKA HISAHIRO;NOTOHARA YASUHIRO;YATSUNAMI RYUICHI;MIYANISHI SATORU
分类号 B32B15/00;B05D3/02 主分类号 B32B15/00
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