| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad through which slurry is hard to permeate to a back surface and having sufficient polishing force. <P>SOLUTION: This manufacturing method of the polishing pad 1 manufactures the polishing pad 1 on the polishing surface 11 of which a groove 12 is formed, and includes two stage pressing processes of: the first pressing process to press sheet type artificial leather 10 to be a pad material uniformly in a direction vertical with the polishing surface 11; and the second pressing process to press the polishing surface 11 of the artificial leather 10 by a metal die 51 for groove formation made of a frame in a shape corresponding to the groove 12 to form. The groove 12 is formed by pressing work using the metal die 51 for groove formation and the material in the periphery of the groove is compressed and its density is improved high under this manufacturing method, and consequently, the slurry is hardly permeate through to the back surface of the polishing pad 1. The polishing pad has the sufficient polishing force, since a polishing portion 13 of the polishing surface 11 is also compressed in the first pressing process and its rigidity is improved. <P>COPYRIGHT: (C)2009,JPO&INPIT |
