发明名称 BACK-ILLUMINATED TYPE IMAGING DEVICE AND FABRICATION METHOD THEREOF
摘要 Light is illuminated from a back-surface side of a silicon substrate 4. A back-illuminated type imaging device 100 reads out, from a front-surface side of the silicon substrate 4, charges that are generated in the silicon substrate 4 in response to the illuminated light, so as to perform imaging. The back-illuminated type imaging device 100 includes pad portions 17 formed on the back surface of the semiconductor substrate 4, and a plurality of pillars 9 that are formed in the semiconductor substrate 4, are made of a conductive material and electrically connect wiring portions 12 formed on the front surface of the semiconductor substrate 4 and the pad portions 17 to each other.
申请公布号 US2008308890(A1) 申请公布日期 2008.12.18
申请号 US20080138294 申请日期 2008.06.12
申请人 UYA SHINJI 发明人 UYA SHINJI
分类号 H01L31/0216;H01L31/18 主分类号 H01L31/0216
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