发明名称 |
SUBSTRATE STAGE, HEAT TREATMENT EQUIPMENT AND PROCESS FOR MANUFACTURING SUBSTRATE STAGE |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate stage having high abrasion resistance and not causing stripping charge. SOLUTION: On the surface 12 for mounting a substrate W formed on a stage main body 11, a predetermined emboss shape E is formed by embossing and then an alumina film A under amorphous state is formed by anodization. The alumina film A of amorphous structure is minute and firm. Consequently, it has high abrasion resistance and can prevent stripping charge substantially. COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008306213(A) |
申请公布日期 |
2008.12.18 |
申请号 |
JP20080224581 |
申请日期 |
2008.09.02 |
申请人 |
TOHOKU UNIV;FUTURE VISION:KK;KOYO THERMO SYSTEM KK |
发明人 |
OMI TADAHIRO;MURAOKA YUSUKE;MIYAJI YASUYOSHI;NAGASHIMA YASUSHI |
分类号 |
H01L21/683 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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