发明名称 SUBSTRATE STAGE, HEAT TREATMENT EQUIPMENT AND PROCESS FOR MANUFACTURING SUBSTRATE STAGE
摘要 PROBLEM TO BE SOLVED: To provide a substrate stage having high abrasion resistance and not causing stripping charge. SOLUTION: On the surface 12 for mounting a substrate W formed on a stage main body 11, a predetermined emboss shape E is formed by embossing and then an alumina film A under amorphous state is formed by anodization. The alumina film A of amorphous structure is minute and firm. Consequently, it has high abrasion resistance and can prevent stripping charge substantially. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008306213(A) 申请公布日期 2008.12.18
申请号 JP20080224581 申请日期 2008.09.02
申请人 TOHOKU UNIV;FUTURE VISION:KK;KOYO THERMO SYSTEM KK 发明人 OMI TADAHIRO;MURAOKA YUSUKE;MIYAJI YASUYOSHI;NAGASHIMA YASUSHI
分类号 H01L21/683 主分类号 H01L21/683
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