发明名称 Memory devices with isolation structures and methods of forming and programming the same
摘要 Memory devices and methods of programming and forming the same are disclosed. In one embodiment, a memory device has memory cells contained within dielectric isolation structures to isolate them from at least those memory cells in communication with other bit lines, such as to facilitate forward-bias write operations. The dielectric isolation structures contain an upper well having a first conductivity type and a buried well having a second conductivity type. By forward biasing the junction from the buried well to the upper well, electrons can be injected into charge-storage nodes of memory cells that are contained within the dielectric isolation structures.
申请公布号 US2008308855(A1) 申请公布日期 2008.12.18
申请号 US20070811702 申请日期 2007.06.12
申请人 MICRON TECHNOLOGY, INC. 发明人 EL-KAREH BADIH;FORBES LEONARD
分类号 H01L29/00;H01L21/336 主分类号 H01L29/00
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