发明名称 FIELD EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a new field effect transistor using a semiconductor nanowire, and its manufacturing method. <P>SOLUTION: The field effect transistor includes a gate electrode film 14, the plurality of semiconductor nanowires 11 disposed so as to pass through the gate electrode film 14, a source electrode film 12 formed so as to be in contact with one end of each of the semiconductor nanowires 11 to connect them, and a drain electrode film 13 formed so as to be in contact with the other end of each of the semiconductor nanowires to connect them. The source electrode film 12 and the drain electrode film 13 are composed of a metal. An insulating layer 15 is arranged between the gate electrode film 14 and the semiconductor nanowires 11. The types of the semiconductors at one end and the other end of the semiconductor nanowires 11 are either P type or N type. The type of the semiconductor at the center part held by the one end and the other end is different from the type of the semiconductor at the one end and the other end. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008305982(A) 申请公布日期 2008.12.18
申请号 JP20070151827 申请日期 2007.06.07
申请人 PANASONIC CORP 发明人 TORII HIDEO
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
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