发明名称 Field effect transistor, logic circuit including the same and methods of manufacturing the same
摘要 Provided are a field effect transistor, a logic circuit including the same and methods of manufacturing the same. The field effect transistor may include an ambipolar layer that includes a source region, a drain region, and a channel region between the source region and the drain region, wherein the source region, the drain region, and the channel region may be formed in a monolithic structure, a gate electrode on the channel region, and an insulating layer separating the gate electrode from the ambipolar layer, wherein the source region and the drain region have a width greater than that of the channel region in a second direction that crosses a first direction in which the source region and the drain region are connected to each other.
申请公布号 US2008312088(A1) 申请公布日期 2008.12.18
申请号 US20070005372 申请日期 2007.12.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHUNG HYUN-JONG;JUNG RAN-JU;SEO SUN-AE;KIM DONG-CHUL;LEE CHANG-WON
分类号 H01L29/24;H01L21/336;H01L21/84 主分类号 H01L29/24
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